Fabrication of novel multi-layers for X-ray mirrors by controlled growth with sequential surface chemical reactions

We propose the fabrication of soft x-ray multilayers by atomic-layer-controlled growth with sequential surface chemical reactions. This deposition technique enables sequential dosing of a surface with appropriate chemical precursors to promote surface chemical reactions which are inherently self-limiting. We have found the self-limiting adsorption mechanism in the fabrication of oxide thin films such as Al₂O₃ and report atomic layer deposition even at room temperature