Title :
Optical properties of ZrO2 films fabricated by ion beam sputtering deposition at low temperature
Author :
Atuchin, V.V. ; Aliev, V.Sh. ; Kruchinin, V.N. ; Ramana, C.V.
Author_Institution :
Lab. of Opt. Mater. & Struct., SB RAS, Novosibirsk
Abstract :
ZrO2 films have been deposited on Si(100) by ion beam sputtering deposition (IBSD) at temperature T = 70degC. Film structure properties and ZrO2/Si interface were observed with reflection high energy electron diffraction (RHEED) and high resolution transmission electron microscopy (HRTEM). Optical properties of the film were studied by spectroscopic ellipsometry over the spectral range 250-900 nm.
Keywords :
crystal structure; ellipsometry; interface structure; ion beam assisted deposition; optical films; reflection high energy electron diffraction; sputter deposition; transmission electron microscopy; ultraviolet spectra; visible spectra; zirconium compounds; Si; ZrO2; film structure; high resolution transmission electron microscopy; ion beam sputtering deposition; optical properties; reflection high energy electron diffraction; temperature 70 C; wavelength 250 nm to 900 nm; Electron optics; Energy resolution; Ion beams; Optical diffraction; Optical films; Optical reflection; Particle beam optics; Semiconductor films; Sputtering; Temperature; ZrO2/Si; ion beam sputtering deposition;
Conference_Titel :
Strategic Technology, 2007. IFOST 2007. International Forum on
Conference_Location :
Ulaanbaatar
Print_ISBN :
978-1-4244-3589-0
Electronic_ISBN :
978-1-4244-1831-2
DOI :
10.1109/IFOST.2007.4798650
