Title :
The generalized model of plasma technological system node and its applications
Author :
Geller, V.M. ; Khrustalev, V.A. ; Vantsev, D.V.
Author_Institution :
Novosibirsk State Tech. Univ., Novosibirsk
Abstract :
In practical problems of plasma technology an engineer is often confronted with the complicated character of plasma processes taking place in a plasma reactor. It must take into consideration some factors caused with as the plasma processes as the constructive and geometrical characteristics of technological reactors and processing items. The plasma process control problem may be noticeably simplified with using simplifying models of plasma effects existing in the plasma device and reactor inner space. One such model is proposed and analyzed in this paper.
Keywords :
plasma applications; plasma devices; plasma filled waveguides; plasma simulation; doubly-connected cavity waveguide section; generalized model; geometrical characteristics; plasma device; plasma process control; plasma processes; plasma reactor; plasma technological system node; technological reactors; Conductivity; Frequency; Inductors; Insulation; Plasma applications; Plasma devices; Plasma materials processing; Plasma properties; Plasma waves; Space technology;
Conference_Titel :
Strategic Technology, 2007. IFOST 2007. International Forum on
Conference_Location :
Ulaanbaatar
Print_ISBN :
978-1-4244-3589-0
Electronic_ISBN :
978-1-4244-1831-2
DOI :
10.1109/IFOST.2007.4798671
