The generalized model of plasma technological system node and its applications

In practical problems of plasma technology an engineer is often confronted with the complicated character of plasma processes taking place in a plasma reactor. It must take into consideration some factors caused with as the plasma processes as the constructive and geometrical characteristics of technological reactors and processing items. The plasma process control problem may be noticeably simplified with using simplifying models of plasma effects existing in the plasma device and reactor inner space. One such model is proposed and analyzed in this paper.