DocumentCode :
2959094
Title :
Tamper Resistivity Analysis for Nano-meter LSI with Process Variations
Author :
Ikeda, Makoto ; Yamauchi, Hiroshi ; Asada, Kunihiro
Author_Institution :
Univ. of Tokyo, Tokyo
fYear :
2006
fDate :
10-13 Dec. 2006
Firstpage :
387
Lastpage :
390
Abstract :
We have studied tamper resistivity with process variations. We have established a simulation platform to evaluate target LSI with differential electro-magnetic analysis. We have shown that wave dynamic differential logic (WDDL) becomes weak in terms of process variation. Based on the simulation platform, we have demonstrated several design styles including short wire, wire segmentation, and 3-wire, 3-phase systems.
Keywords :
cryptography; large scale integration; differential electromagnetic analysis; nanometer LSI; process variations; short wire; tamper resistivity analysis; three-phase systems; wave dynamic differential logic; wire segmentation; Analytical models; Antenna measurements; Conductivity; Cryptography; Large scale integration; Logic; Pattern analysis; Very large scale integration; Wire; Wiring;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics, Circuits and Systems, 2006. ICECS '06. 13th IEEE International Conference on
Conference_Location :
Nice
Print_ISBN :
1-4244-0395-2
Electronic_ISBN :
1-4244-0395-2
Type :
conf
DOI :
10.1109/ICECS.2006.379806
Filename :
4263384
Link To Document :
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