DocumentCode :
2959278
Title :
Thru-silicon interconnect technology
Author :
Savastiouk, Sergey ; Siniaguine, Oleg ; Reche, John ; Korczynski, Ed
Author_Institution :
Tru-Si Technol., Sunnyvale, CA, USA
fYear :
2000
fDate :
2000
Firstpage :
122
Lastpage :
128
Abstract :
Wafer-level packaging (WLP) is forecast to be less expensive than die-level packaging, though many fundamentally new technologies are needed to fulfil this potential. For a complete WLP process flow to be cost-effective, all newly developed technologies should be simple and inexpensive to implement in high-volume manufacturing. Chip-scale packages (CSPs) produced with a WLP process flow are particularly advantageous when combined with flip-chip/BGA connections, since direct-chip attach (DCA) parts can thus be produced entirely by a wafer-fab. A new process technology-atmospheric downstream plasma (ADP) gas etching-allows for the WLP formation of backside thru-silicon contacts for DCA applications. Thru-silicon designs and manufacturing process flows are introduced as means to produce 3D wafer level packaging solutions. Standard silicon IC manufacturing unit-processes must be combined into robust process-flows to allow for the rapid deployment of wafer-level packaging throughout the industry
Keywords :
ball grid arrays; chip scale packaging; electrical contacts; elemental semiconductors; flip-chip devices; integrated circuit interconnections; plasma materials processing; silicon; sputter etching; 3D wafer level packaging; BGA connections; CSPs; DCA applications; Si; WLP formation; WLP process flow; atmospheric downstream plasma gas etching; backside thru-silicon contacts; chip-scale packages; cost-effectiveness; die-level packaging; direct-chip attach; flip-chip connections; manufacturing process flows; process technology; robust process-flows; silicon IC manufacturing unit-processes; thru-silicon designs; thru-silicon interconnect technology; volume manufacturing; wafer-level packaging; Chip scale packaging; Etching; Manufacturing processes; Plasma applications; Plasma materials processing; Process design; Robustness; Silicon; Technology forecasting; Wafer scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics Manufacturing Technology Symposium, 2000. Twenty-Sixth IEEE/CPMT International
Conference_Location :
Santa Clara, CA
ISSN :
1089-8190
Print_ISBN :
0-7803-6482-1
Type :
conf
DOI :
10.1109/IEMT.2000.910720
Filename :
910720
Link To Document :
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