Title :
Flux-underfill compatibility and failure mode analysis in high yield flip chip processing
Author :
Tsai, W. Mike ; Houston, Paul N. ; Baldwin, Daniel F.
Author_Institution :
George W. Woodruff Sch. of Mech. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
Abstract :
The compatibility of flux and underfill material systems significantly contributes to the formation and growth of process-induced defects and further influences flip chip reliability. Various no-clean fluxes, along with a water-soluble flux used as the baseline, are tested with two fast flow, snap cure underfills. Liquid-to-liquid thermal shock and temperature and humidity tests are conducted to evaluate the reliability of each flux-underfill material system. The failure modes, specifically underfill delamination, solder fatigue, and die cracking, are identified and analyzed. The correlation between process manufacturing defects, failure modes, and long-term reliability are determined. Understanding these failure modes will further enable and facilitate the implementation of low cost, high yield flip chip processing in standard surface mount technology
Keywords :
cracks; delamination; failure analysis; fatigue; flip-chip devices; humidity; integrated circuit interconnections; integrated circuit packaging; integrated circuit reliability; integrated circuit yield; microassembling; surface mount technology; thermal shock; thermal stresses; die cracking; failure mode analysis; failure modes; fast flow snap cure underfills; flip chip process yield; flip chip processing; flip chip reliability; flux-underfill compatibility; flux-underfill material system; liquid-to-liquid thermal shock tests; long-term reliability; no-clean fluxes; process manufacturing defects; process-induced defects; reliability; solder fatigue; solder flux; surface mount technology; temperature/humidity tests; underfill delamination; underfill material; water-soluble flux; Conducting materials; Electric shock; Failure analysis; Flip chip; Humidity; Materials reliability; Materials testing; System testing; Temperature; Thermal conductivity;
Conference_Titel :
Electronics Manufacturing Technology Symposium, 2000. Twenty-Sixth IEEE/CPMT International
Conference_Location :
Santa Clara, CA
Print_ISBN :
0-7803-6482-1
DOI :
10.1109/IEMT.2000.910725