• DocumentCode
    2963331
  • Title

    IEEE 2007 International Interconnect Technology Conference

  • fYear
    2007
  • fDate
    4-6 June 2007
  • Abstract
    The following topics are dealt with: metallization; integration; systems; reliability/contact; and new concepts.
  • Keywords
    electromigration; integrated circuit interconnections; integrated circuit metallisation; integrated circuit reliability; integrated circuit technology; 3D integration; IC technology; electromigration; interconnect technology; reliability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    International Interconnect Technology Conference, IEEE 2007
  • Conference_Location
    Burlingame, CA
  • Print_ISBN
    1-4244-1069-X
  • Electronic_ISBN
    1-4244-1070-3
  • Type

    conf

  • DOI
    10.1109/IITC.2007.382323
  • Filename
    4263635