• DocumentCode
    2964848
  • Title

    Process development of electron beam lithography in an academic environment

  • Author

    Gatlin, Gregory S. ; Eskridge, Cory W. ; Brinkerhoff, Jacob M. ; Fife, Jared D. ; Jessing, Jeffrey R.

  • Author_Institution
    Boise State Univ., ID, USA
  • fYear
    2004
  • fDate
    2004
  • Firstpage
    117
  • Lastpage
    119
  • Abstract
    This paper compares the processes of photolithography and electron beam lithography (EBL). In addition, we discuss the procedure used to implement EBL in a university laboratory, specifically Boise State University´s (BSU) Idaho Microfabrication Laboratory (IML).
  • Keywords
    electron beam lithography; laboratories; laboratory techniques; academic environment; electron beam lithography; leading edge capabilities; numerical aperture; process development; random patterns; scanning electron microscope; serial patterning; university laboratory; Coatings; Electron beams; Electron optics; Laboratories; Lithography; Optical sensors; Optical surface waves; Production; Resists; Scanning electron microscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics and Electron Devices, 2004 IEEE Workshop on
  • Print_ISBN
    0-7803-8369-9
  • Type

    conf

  • DOI
    10.1109/WMED.2004.1297370
  • Filename
    1297370
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2964848