• DocumentCode
    2966499
  • Title

    Fabrication of silicon mold for thermal Nanoimprint Lithography

  • Author

    Matsui, J. ; Takahashi, H. ; Xie, N. ; Mizuno, J. ; Utaka, K.

  • Author_Institution
    Grad. Sch. of Adv. Sci. & Eng., Waseda Univ., Tokyo
  • fYear
    2008
  • fDate
    2-15 Aug. 2008
  • Firstpage
    267
  • Lastpage
    268
  • Abstract
    We fabricated a silicon mold for thermal Nanoimprint Lithography (NIL) with EB exposure and Deep-RIE. As a result, we obtained that including a grating whose pitch was 230nm with low roughness.
  • Keywords
    diffraction gratings; electron beam applications; elemental semiconductors; moulding; nanolithography; semiconductor growth; silicon; sputter etching; Si; deep reactive ion etching; electron beam exposure; grating; pitch; roughness; silicon mold; thermal nanoimprint lithography; Etching; Fabrication; Gratings; Lithography; Nanolithography; Resists; Silicon; Switches; Thermal engineering; Wavelength division multiplexing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano-Optoelectronics Workshop, 2008. i-NOW 2008. International
  • Conference_Location
    Shonan Village
  • Print_ISBN
    978-1-4244-2656-0
  • Type

    conf

  • DOI
    10.1109/INOW.2008.4634540
  • Filename
    4634540
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2966499