DocumentCode
2969041
Title
Oxygen sensing with ZnO thin films
Author
Blauw, M.A. ; Dam, V.A.T. ; Crego-Calama, M. ; Brongersma, S.H. ; Musschoot, J. ; Detavernier, C.
Author_Institution
Holst Centre, imec, Eindhoven, Netherlands
fYear
2011
fDate
28-31 Oct. 2011
Firstpage
1416
Lastpage
1419
Abstract
ZnO thin films for O2 sensing were obtained with atomic layer deposition (ALD) and treated with rapid thermal annealing (RTA). The response of the ZnO conductivity to O2 exposure is reversible at 270°C. The sensitivity and responsivity are increased in comparison with O2 sensing at 500°C that was reported in literature. It is assumed that the improved O2 sensing characteristics are due to the increased surface-to-volume ratio of the film. The responsivity that is defined as the inverse of response time also improved because of the decreased bulk diffusion length. The application of ZnO thin films that are obtained by ALD to O2 sensing thus results in reduced power consumption while improving the O2 sensing characteristics.
Keywords
atomic layer deposition; gas sensors; oxygen; power consumption; rapid thermal annealing; thin films; zinc compounds; ALD; O; RTA; ZnO; atomic layer deposition; conductivity; gas sensor; power consumption; rapid thermal annealing; thin films; Conductivity; Films; Plasma temperature; Temperature measurement; Temperature sensors; Zinc oxide;
fLanguage
English
Publisher
ieee
Conference_Titel
Sensors, 2011 IEEE
Conference_Location
Limerick
ISSN
1930-0395
Print_ISBN
978-1-4244-9290-9
Type
conf
DOI
10.1109/ICSENS.2011.6127128
Filename
6127128
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