• DocumentCode
    2969525
  • Title

    3DIC multi-project-wafer program: A collaboration to provide fabrication access

  • Author

    Tyree, Vance

  • fYear
    2010
  • fDate
    16-18 Nov. 2010
  • Firstpage
    1
  • Lastpage
    17
  • Abstract
    A collection of slides from the author´s conference presentation is given. The following topics are discussed: 3DIC multiproject-wafer program; CMP/CMC/MOSIS; MOSIS multiproject wafer; Tezzaron 3DIC technology; silicon workbench for photonics; and silicon workbench for MEMS and III-V compound semiconductors.
  • Keywords
    III-V semiconductors; chemical mechanical polishing; elemental semiconductors; integrated circuit design; micromechanical devices; silicon; three-dimensional integrated circuits; 3DIC multiproject-wafer program; CMC; CMP; III-V compound semiconductor; MEMS; MOSIS multiproject wafer; Tezzaron 3DIC technology; photonics; silicon workbench; Collaboration; Fabrication; Foundries; Mirrors; Physics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    3D Systems Integration Conference (3DIC), 2010 IEEE International
  • Conference_Location
    Munich
  • Print_ISBN
    978-1-4577-0526-7
  • Type

    conf

  • DOI
    10.1109/3DIC.2010.5751416
  • Filename
    5751416