Title :
Development of probes for cochlear implants
Author :
Lawand, Nishant S. ; French, Paddy J. ; Briaire, J.J. ; Frijns, J.H.M.
Author_Institution :
Electron. Instrum. Lab., Delft Univ. of Technol., Delft, Netherlands
Abstract :
In this paper the development of the probes with respect to the fabrication aspect is shown. The stiff probe is formed by defining the probe thickness and releasing at the end by deep reactive ion etching. These stiff probes were fabricated in order to study the problems involved in the fabrication procedure and the behaviour of the probes when they are inserted perpendicular to the auditory nerve. The probes were fabricated with lengths ranging from 3.5 mm up to 13.5 mm and thickness between 50 to 60 microns.
Keywords :
cochlear implants; microfabrication; probes; sputter etching; auditory nerve; cochlear implants; deep reactive ion etching; fabrication procedure; probe thickness; probes development; stiff probe; Arrays; Cochlear implants; Electrodes; Etching; Fabrication; Probes; Silicon;
Conference_Titel :
Sensors, 2011 IEEE
Conference_Location :
Limerick
Print_ISBN :
978-1-4244-9290-9
DOI :
10.1109/ICSENS.2011.6127178