• DocumentCode
    2970361
  • Title

    VUV efficiency and radiant emittance characterization of xenon positive column discharges

  • Author

    Doughty, D.A.

  • Author_Institution
    GE Corp. Res. & Dev., Schenectady, NY, USA
  • fYear
    1996
  • fDate
    3-5 June 1996
  • Firstpage
    135
  • Abstract
    Summary form only given, as follows. The pure xenon dc positive column discharge has been characterized for various xenon pressures, currents, and discharge tube radii. The absolute output at the 147 nm resonance transition has been measured using two independent techniques to yield the radiant emittance at 147 nm (power per unit surface area). The efficiency of 147 nm production is obtained by combining the measured radiant emittance with the measured electrical power per unit length deposited in the gas. The radiant emittance and the efficiency are the two principle figures of merit for characterizing the discharge as a source of VUV radiation. It is observed that the trends in efficiency and radiant emittance change substantially when the discharge transitions from two-step electron impact excitation/ionization at higher pressures to single-step electron impact ionization at lower pressures. Modeling of the xenon positive column discharge yields radiant emittance and efficiency predictions that are consistent with the measured values, though the predicted trends from the model do not always agree with the measurements.
  • Keywords
    xenon; 147 nm; VUV efficiency; Xe; Xe positive column discharges; discharge tube radii; electrical power; modeling; radiant emittance; radiant emittance characterization; single-step electron impact ionization; two-step electron impact excitation/ionization; Area measurement; Electric variables measurement; Electron emission; Electron tubes; Fault location; Length measurement; Power measurement; Predictive models; Resonance; Xenon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
  • Conference_Location
    Boston, MA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-3322-5
  • Type

    conf

  • DOI
    10.1109/PLASMA.1996.550633
  • Filename
    550633