• DocumentCode
    2970487
  • Title

    Thin oxide discussion group summary moderators

  • Author

    DiMaria, D.J. ; Suehle, J.S.

  • Author_Institution
    IBM
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    120
  • Lastpage
    120
  • Keywords
    CMOS technology; Circuit testing; Dielectric breakdown; Dielectric materials; Electric breakdown; High K dielectric materials; High-K gate dielectrics; Plasma materials processing; Qualifications; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop Final Report, 2000 IEEE International
  • Print_ISBN
    0-7803-6392-2
  • Type

    conf

  • DOI
    10.1109/IRWS.2000.911915
  • Filename
    911915
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2970487