DocumentCode
2971387
Title
Development of thin film capacitors for power system applications by PVD technique
Author
Radzuan, R. ; Salleh, M. K Mohd ; Hamzah, M.K. ; Zulkefle, Habibah ; Sin, Nor Diyana Md ; Rusop, M.
Author_Institution
Fac. of Electr. Eng., Univ. Teknol. MARA, Shah Alam, Malaysia
fYear
2012
fDate
24-27 June 2012
Firstpage
1097
Lastpage
1100
Abstract
Thin film capacitors are very interesting option to electrolytic capacitors, because they are simple, compact in structure and effective for fabrication of high frequency devices. Thin film coating capacitors also improved processing characteristics and better dielectric strength. This paper reports the development of thin film capacitors for DC filtering in AC/DC converter application. The design of thin film capacitor for high frequency AC/DC converter is implemented using simple simulation tools. The primary research hypothesis is that high frequency capacitance with smaller size can be implemented using Physical Vapor Deposition, PVD technique. The thickness of TiO2, area of metal contact and dielectric properties of TiO2 are considered as parameters for thin film capacitors development.
Keywords
AC-DC power convertors; coating techniques; electric strength; electrolytic capacitors; power electronics; thin film capacitors; vapour deposition; AC/DC converter; DC filtering; PVD technique; dielectric strength; electrolytic capacitors; physical vapor deposition; power system applications; thin film coating capacitors; Capacitance; Capacitors; Chemical vapor deposition; DC-DC power converters; Dielectric constant; Dielectric materials; Silicon; PVD; TiO2 ; high-k dielectrics; thin film capacitor;
fLanguage
English
Publisher
ieee
Conference_Titel
Humanities, Science and Engineering Research (SHUSER), 2012 IEEE Symposium on
Conference_Location
Kuala Lumpur
Print_ISBN
978-1-4673-1311-7
Type
conf
DOI
10.1109/SHUSER.2012.6268788
Filename
6268788
Link To Document