DocumentCode :
2971387
Title :
Development of thin film capacitors for power system applications by PVD technique
Author :
Radzuan, R. ; Salleh, M. K Mohd ; Hamzah, M.K. ; Zulkefle, Habibah ; Sin, Nor Diyana Md ; Rusop, M.
Author_Institution :
Fac. of Electr. Eng., Univ. Teknol. MARA, Shah Alam, Malaysia
fYear :
2012
fDate :
24-27 June 2012
Firstpage :
1097
Lastpage :
1100
Abstract :
Thin film capacitors are very interesting option to electrolytic capacitors, because they are simple, compact in structure and effective for fabrication of high frequency devices. Thin film coating capacitors also improved processing characteristics and better dielectric strength. This paper reports the development of thin film capacitors for DC filtering in AC/DC converter application. The design of thin film capacitor for high frequency AC/DC converter is implemented using simple simulation tools. The primary research hypothesis is that high frequency capacitance with smaller size can be implemented using Physical Vapor Deposition, PVD technique. The thickness of TiO2, area of metal contact and dielectric properties of TiO2 are considered as parameters for thin film capacitors development.
Keywords :
AC-DC power convertors; coating techniques; electric strength; electrolytic capacitors; power electronics; thin film capacitors; vapour deposition; AC/DC converter; DC filtering; PVD technique; dielectric strength; electrolytic capacitors; physical vapor deposition; power system applications; thin film coating capacitors; Capacitance; Capacitors; Chemical vapor deposition; DC-DC power converters; Dielectric constant; Dielectric materials; Silicon; PVD; TiO2; high-k dielectrics; thin film capacitor;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Humanities, Science and Engineering Research (SHUSER), 2012 IEEE Symposium on
Conference_Location :
Kuala Lumpur
Print_ISBN :
978-1-4673-1311-7
Type :
conf
DOI :
10.1109/SHUSER.2012.6268788
Filename :
6268788
Link To Document :
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