DocumentCode
2972778
Title
Demonstration of a Low Loss W-band Interconnect and Circuit Isolation Structure for Wafer Scale Assembly
Author
Farkas, David S. ; Luna, Tony ; Chang-Chien, Patty P. ; Tornquist, Kelly ; Fordham, Owen ; Tsai, Roger
Author_Institution
Northrop Grumman Corp., Redondo Beach
fYear
2007
fDate
3-8 June 2007
Firstpage
1641
Lastpage
1644
Abstract
In this paper, we demonstrate wafer scale assembly (WSA) technology at W-band frequencies. This technology enables compact and high performance millimeter-wave modules to be manufactured using the high volume, batch fabrication processes that are currently used to produce MMIC´s. Key features of WSA are vertical, low loss interconnects that are fabricated with a high level of uniformity, and compact MMIC channelization through the use of isolation fences. In this paper, we demonstrate vertical WSA interconnects with less than 0.2 dB of insertion loss at W-band with high levels of uniformity. We also demonstrate a single isolation fence that provides 30 dB of isolation. This technology has the potential to vertically integrated several MMIC layers to form compact, multilayer millimeter-wave modules.
Keywords
integrated circuit interconnections; microwave integrated circuits; millimetre wave integrated circuits; MIMIC; MMIC; circuit isolation structure; low loss w-band interconnect; wafer scale assembly; Assembly; Fabrication; Frequency; Insertion loss; Integrated circuit interconnections; Isolation technology; MMICs; Manufacturing processes; Millimeter wave circuits; Millimeter wave technology; Interconnections; MMICs; Millimeter Wave Circuits; Multichip Modules; Wafer Bonding; Wafer-scale Integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Symposium, 2007. IEEE/MTT-S International
Conference_Location
Honolulu, HI
ISSN
0149-645X
Print_ISBN
1-4244-0688-9
Electronic_ISBN
0149-645X
Type
conf
DOI
10.1109/MWSYM.2007.380002
Filename
4264163
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