DocumentCode
2974693
Title
Modeling and Measurements of Electrical and Thermal Memory Effects for RF power LDMOS
Author
Tornblad, Olof ; Wu, Bin ; Dai, Wenhua ; Blair, Cindy ; Ma, Gordon ; Dutton, Robert W.
Author_Institution
Infineon Technol. North America Corp., Morgan Hill
fYear
2007
fDate
3-8 June 2007
Firstpage
2015
Lastpage
2018
Abstract
Accurate modeling of memory effects is important for design of amplifiers with high requirements on linearity. In this work, asymmetries in third order intermodulation distortion products (IM3) were measured for different tone-spacings and compared to simulations. An accurate large-signal model and careful modeling of the test circuit, especially the drain bias feeds is important for correct prediction of sideband asymmetries. Transient thermal measurements were employed to extract a thermal network with two time constants, one for the die and another one for the package. The IM3 asymmetries were found to be dominated by impedances in the output circuit for large tone-spacings; for very small tone-spacings (< 10 kHz), thermal effects have an important influence. The IM3 asymmetries agreed qualitatively well between simulations and measurements as a function of output power for different tone-spacings.
Keywords
intermodulation distortion; power MOSFET; power amplifiers; radiofrequency amplifiers; semiconductor device measurement; semiconductor device models; IM3 asymmetries; RF power LDMOS; amplifier design; drain bias; electrical memory effects; large-signal model; lateral double-diffused MOSFET; sideband asymmetries; thermal memory effects; third order intermodulation distortion products; time constants; tone spacing; transient thermal measurements; Circuit simulation; Circuit testing; Distortion measurement; Electric variables measurement; Intermodulation distortion; Linearity; Power measurement; Predictive models; Radio frequency; Radiofrequency amplifiers;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Symposium, 2007. IEEE/MTT-S International
Conference_Location
Honolulu, HI
ISSN
0149-645X
Print_ISBN
1-4244-0688-9
Electronic_ISBN
0149-645X
Type
conf
DOI
10.1109/MWSYM.2007.380245
Filename
4264262
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