• DocumentCode
    2974837
  • Title

    Present and future environmental "problems" with SF/sub 6/ and other fluorinated gases

  • Author

    Van Brunt, R.J.

  • Author_Institution
    Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA
  • fYear
    1996
  • fDate
    3-5 June 1996
  • Firstpage
    145
  • Abstract
    Summary form only given. Sulfur hexafluoride (SF/sub 6/) is widely used as an insulating and arc interrupting gas in high-voltage systems and has found application in plasma processing of materials. Because it is nontoxic, chemically inert, and thermally stable at temperatures up to 500/spl deg/C, SF/sub 6/ has been considered to be an environmentally safe and acceptable gas for most applications. However, SF/sub 6/ is known to decompose in electrical discharges to form toxic and corrosive gaseous compounds such as SOF/sub 4/, SOF/sub 2/, SO/sub 2/F/sub 2/, and HF. These products are generated under a wide range of conditions in both low-pressure and high-pressure discharges. Of particular concern are the species S/sub 2/F/sub 10/ and S/sub 2/O/sub 2/F/sub 10/ that are known to be highly toxic and to be formed in corona, spark, and arc discharges in high-pressure SF/sub 6/. The conditions under which these byproducts are formed, the methods for removal, and the possible hazards that they present are reviewed. Sulfur hexafluoride is also an efficient absorber of infrared radiation and is estimated to have a global warming potential that is 2.5/spl times/10/sup 4/ times greater than that of CO/sub 2/.
  • Keywords
    sulphur compounds; HF; S/sub 2/F/sub 10/; S/sub 2/O/sub 2/F/sub 10/; SF/sub 6/; SO/sub 2/F/sub 2/; SOF/sub 2/; SOF/sub 4/; arc discharges; arc interrupting gas; corona; electrical discharges; environmental problems; fluorinated gases; global warming potential; high-pressure discharges; high-voltage systems; infrared radiation absorption; insulating gas; low-pressure discharges; plasma processing; spark discharges; Chemicals; Corona; Gas insulation; Hafnium; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma stability; Plasma temperature; Sulfur hexafluoride;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
  • Conference_Location
    Boston, MA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-3322-5
  • Type

    conf

  • DOI
    10.1109/PLASMA.1996.550655
  • Filename
    550655