DocumentCode
2976972
Title
The forming of intensive metal ion flows in plasma beam discharge
Author
Zinovyev, D.V. ; Tseluyko, A.F. ; Farenik, V.I. ; Yunakov, N.N.
Author_Institution
Kharkov State Univ., Ukraine
fYear
1996
fDate
3-5 June 1996
Firstpage
150
Abstract
Summary form only given. The process of dense metal ion flows with energy in the range 10/sup 2/-10/sup 3/ eV in a plasma beam discharge in the plasma break-down of disruptive distance is studied. The creation of metal vapor was possible at the expense of heating of the metal test piece, inserted into a primary gas discharge plasma by means of supplying of voltage up to 10/sup 3/ V as to plasma potential and forming the ion flows on the test piece. After attainment of boiling temperature we can see the sudden increase at metal atoms near the test piece and the creation of a dense metal plasma due to vapor ionization by accelerated electrons. With the occurence of a dense surface secondary plasma ´pushing away´ the electric field from the evaporating test piece, a double electric layer of space charge occurs on the interface between these two plasmas. It forms the primary plasma electron flows and secondary plasma ion flows. The energy of the charged particles is regulated by changing the voltage on the evaporating test-piece. The metal ion current value and electron current value are regulated by changing the concentration of primary gas discharged plasma.
Keywords
plasma flow; 100 to 1000 eV; 1000 V; accelerated electrons; boiling temperature; charged particles; dense metal plasma; double electric layer; electric field; intensive metal ion flows; metal electron current; metal ion current; metal test piece; metal vapor; plasma beam discharge; plasma break-down; plasma electron flows; plasma potential; primary gas discharge plasma; space charge; vapor ionization; Atomic layer deposition; Discharges; Electrons; Heating; Particle beams; Plasma accelerators; Plasma density; Plasma temperature; Testing; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
Conference_Location
Boston, MA, USA
ISSN
0730-9244
Print_ISBN
0-7803-3322-5
Type
conf
DOI
10.1109/PLASMA.1996.550669
Filename
550669
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