• DocumentCode
    2976972
  • Title

    The forming of intensive metal ion flows in plasma beam discharge

  • Author

    Zinovyev, D.V. ; Tseluyko, A.F. ; Farenik, V.I. ; Yunakov, N.N.

  • Author_Institution
    Kharkov State Univ., Ukraine
  • fYear
    1996
  • fDate
    3-5 June 1996
  • Firstpage
    150
  • Abstract
    Summary form only given. The process of dense metal ion flows with energy in the range 10/sup 2/-10/sup 3/ eV in a plasma beam discharge in the plasma break-down of disruptive distance is studied. The creation of metal vapor was possible at the expense of heating of the metal test piece, inserted into a primary gas discharge plasma by means of supplying of voltage up to 10/sup 3/ V as to plasma potential and forming the ion flows on the test piece. After attainment of boiling temperature we can see the sudden increase at metal atoms near the test piece and the creation of a dense metal plasma due to vapor ionization by accelerated electrons. With the occurence of a dense surface secondary plasma ´pushing away´ the electric field from the evaporating test piece, a double electric layer of space charge occurs on the interface between these two plasmas. It forms the primary plasma electron flows and secondary plasma ion flows. The energy of the charged particles is regulated by changing the voltage on the evaporating test-piece. The metal ion current value and electron current value are regulated by changing the concentration of primary gas discharged plasma.
  • Keywords
    plasma flow; 100 to 1000 eV; 1000 V; accelerated electrons; boiling temperature; charged particles; dense metal plasma; double electric layer; electric field; intensive metal ion flows; metal electron current; metal ion current; metal test piece; metal vapor; plasma beam discharge; plasma break-down; plasma electron flows; plasma potential; primary gas discharge plasma; space charge; vapor ionization; Atomic layer deposition; Discharges; Electrons; Heating; Particle beams; Plasma accelerators; Plasma density; Plasma temperature; Testing; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
  • Conference_Location
    Boston, MA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-3322-5
  • Type

    conf

  • DOI
    10.1109/PLASMA.1996.550669
  • Filename
    550669