DocumentCode
2977333
Title
3D Parallel Finite Element Monte Carlo Simulator With Quantum Corrections Using Density Gradient Approach
Author
Aldegunde, Manuel ; Garcia-Loureiro, Antonio J. ; Seoane, Natalia ; Martinez, Antonio ; Kalna, Karol
Author_Institution
Dept. de Electron. y Comput., Univ. de Santiago de Compostela, Santiago de Compostela
fYear
2009
fDate
11-13 Feb. 2009
Firstpage
207
Lastpage
210
Abstract
Novel thin-body architectures with non-planar geometries are foreseen to replace bulk devices at the 18 nm gate length technology and beyond because they have a superior control of electrostatic and can deliver the 2008 ITRS prescribed on-current. We report on the development of a parallel 3D Monte Carlo simulator which uses unstructured tetrahedral elements to describe the geometry of these new architectures. We also describe an incorporation of quantum corrections using the density gradient method since the quantum confinement plays an important role. Finally, we present test simulations of a 10 nm gate length double gate MOSFET with a body thickness of 6 nm, presenting the approach to minimise the magnitude of self forces originating from the use of tetrahedral elements.
Keywords
MOSFET; Monte Carlo methods; finite element analysis; quantum theory; semiconductor device testing; 3D parallel finite element Monte Carlo simulator; density gradient approach; double gate MOSFET; quantum confinement; quantum correction; size 10 nm; size 6 nm; unstructured tetrahedral element; Computational geometry; Computational modeling; Computer architecture; Concurrent computing; Finite element methods; Monte Carlo methods; Potential well; Quantum computing; Quantum mechanics; Solid modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices, 2009. CDE 2009. Spanish Conference on
Conference_Location
Santiago de Compostela
Print_ISBN
978-1-4244-2838-0
Electronic_ISBN
978-1-4244-2839-7
Type
conf
DOI
10.1109/SCED.2009.4800467
Filename
4800467
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