• DocumentCode
    2977613
  • Title

    Fabrication of hot electron transistors controlled by insulated gate

  • Author

    Hino, Takahiro ; Suwa, Akira ; Hasegawa, Takashi ; Saito, Hisashi ; Oono, Masaya ; Miyamoto, Yasuyuki ; Furuya, Kazuhito

  • Author_Institution
    Tokyo Inst. of Technol., Tokyo
  • fYear
    2007
  • fDate
    14-18 May 2007
  • Firstpage
    129
  • Lastpage
    132
  • Abstract
    A hot electron transistor controlled using an insulated gate was fabricated, and collector current modulation by the gate bias was observed at room temperature. In the fabricated devices, a current density of 160 kA/cm2, clear modulation of the collector current, and the insulation properties of the gate were confirmed. The problems observed in our former hot electron transistors with Schottky gate electrodes, such as a low current density and a gate leakage current at room temperature, were solved.
  • Keywords
    Schottky barriers; Schottky gate field effect transistors; current density; hot electron transistors; insulated gate field effect transistors; leakage currents; Schottky gate electrodes; collector current; collector current modulation; current density; gate bias; gate leakage current; insulated gate hot electron transistor; room temperature; temperature 293 K to 298 K; Current density; Electrodes; Electrons; Etching; Fabrication; Indium phosphide; Insulation; Temperature; Voltage; Wiring;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide & Related Materials, 2007. IPRM '07. IEEE 19th International Conference on
  • Conference_Location
    Matsue
  • ISSN
    1092-8669
  • Print_ISBN
    1-4244-0875-X
  • Electronic_ISBN
    1092-8669
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2007.381140
  • Filename
    4265897