DocumentCode
2977613
Title
Fabrication of hot electron transistors controlled by insulated gate
Author
Hino, Takahiro ; Suwa, Akira ; Hasegawa, Takashi ; Saito, Hisashi ; Oono, Masaya ; Miyamoto, Yasuyuki ; Furuya, Kazuhito
Author_Institution
Tokyo Inst. of Technol., Tokyo
fYear
2007
fDate
14-18 May 2007
Firstpage
129
Lastpage
132
Abstract
A hot electron transistor controlled using an insulated gate was fabricated, and collector current modulation by the gate bias was observed at room temperature. In the fabricated devices, a current density of 160 kA/cm2, clear modulation of the collector current, and the insulation properties of the gate were confirmed. The problems observed in our former hot electron transistors with Schottky gate electrodes, such as a low current density and a gate leakage current at room temperature, were solved.
Keywords
Schottky barriers; Schottky gate field effect transistors; current density; hot electron transistors; insulated gate field effect transistors; leakage currents; Schottky gate electrodes; collector current; collector current modulation; current density; gate bias; gate leakage current; insulated gate hot electron transistor; room temperature; temperature 293 K to 298 K; Current density; Electrodes; Electrons; Etching; Fabrication; Indium phosphide; Insulation; Temperature; Voltage; Wiring;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide & Related Materials, 2007. IPRM '07. IEEE 19th International Conference on
Conference_Location
Matsue
ISSN
1092-8669
Print_ISBN
1-4244-0875-X
Electronic_ISBN
1092-8669
Type
conf
DOI
10.1109/ICIPRM.2007.381140
Filename
4265897
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