• DocumentCode
    2977943
  • Title

    Interactions of multipactor and RF circuit

  • Author

    Kishek, R. ; Lau, Y.Y. ; Chernin, D. ; Gilgenbach, Ronald M.

  • Author_Institution
    Michigan Univ., Ann Arbor, MI, USA
  • fYear
    1996
  • fDate
    3-5 June 1996
  • Firstpage
    155
  • Abstract
    Summary form only given. Multipactor is an important resonant discharge phenomenon in microwave cavities, windows, satellite RF payloads, and accelerator structures. We use a simple model to analyze the interaction of multipactor with an RF circuit and obtain the following results. Multipactor current may, transiently, reach a high level, especially in a high Q cavity. It saturates at a much lower level in the steady state, primarily by its loading of the cavity; the space charge effects play a relatively minor role. At saturation, the electron impact energy equals the lowest value that gives unity in the secondary yield curve. There is a new phase focusing mechanism, whereby the leading edge of the multipactor discharge grows at the expense of the trailing edge, in spite of the mutual repulsion among the electrons. This phase focusing mechanism may shape the steady state multipactor in the form of a very tight bunch of electrons. A synthesis of the above results allows us to predict the conditions under which steady state multipactor will occur, once the material of the multipactoring surface is specified.
  • Keywords
    high-frequency discharges; RF circuit; accelerator structures; electron impact energy; high Q cavity; leading edge; microwave cavities; multipactor current; multipactor discharge; multipactor interactions; phase focusing mechanism; resonant discharge phenomenon; satellite RF payloads; saturation; secondary yield curve; steady state; trailing edge; very tight bunch of electrons; windows; Circuits; Electromagnetic heating; Electrons; Kinetic theory; Laboratories; Payloads; Resonance; Satellites; Space charge; Steady-state;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
  • Conference_Location
    Boston, MA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-3322-5
  • Type

    conf

  • DOI
    10.1109/PLASMA.1996.550680
  • Filename
    550680