• DocumentCode
    2978092
  • Title

    Deep Etched DBR Gratings in InP for Photonic Integrated Circuits

  • Author

    Docter, B. ; Geluk, E.J. ; Sander-Jochem, M.J.H. ; Karouta, F. ; Smit, M.K.

  • Author_Institution
    Eindhoven Univ. of Technol., Eindhoven
  • fYear
    2007
  • fDate
    14-18 May 2007
  • Firstpage
    226
  • Lastpage
    228
  • Abstract
    A novel fabrication process was developed to realize high quality SiOx masks for CI2 based ICP etching of InP. First order DBR mirrors, 3 mum deep, were realized that can be used in photonic circuits. The process can be used in combination with conventional optical lithography, reducing production cost.
  • Keywords
    III-V semiconductors; diffraction gratings; distributed Bragg reflectors; indium compounds; integrated optics; photolithography; sputter etching; DBR gratings; DBR mirrors; ICP etching; InP; deep etching; depth 3 mum; distributed Bragg reflector; inductively coupled plasma etching; optical lithography; photonic integrated circuits; Costs; Distributed Bragg reflectors; Etching; Fabrication; Gratings; Indium phosphide; Lithography; Mirrors; Photonic integrated circuits; Production;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide & Related Materials, 2007. IPRM '07. IEEE 19th International Conference on
  • Conference_Location
    Matsue
  • ISSN
    1092-8669
  • Print_ISBN
    1-4244-0875-X
  • Electronic_ISBN
    1092-8669
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2007.381164
  • Filename
    4265921
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2978092