DocumentCode :
2978273
Title :
Investigation of resistance in n-doped Si wires using NEGF formalism
Author :
Martinez, Antonio ; Brown, Andrew ; Asenov, Asen ; Seoane, Natalia
Author_Institution :
Univ. of Glasgow, Glasgow
fYear :
2009
fDate :
11-13 Feb. 2009
Firstpage :
416
Lastpage :
419
Abstract :
In this work we use a full 3D Non-Equilibrium Green Function formalism in the effective mass approximation to calculate the resistance and resistivity of a thin silicon nanowire transistor and a doped silicon nanowire. The Non-Equilibrium green function equations are solved self-consistent with the Poisson equation. The resistances are calculated by averaging the resulting currents from an ensemble of wires and transistors. The number and spatial location of the discrete dopants differ for each device in the ensemble. The calculated resistivities agree with the bulk resistivity corresponding to the average dopant concentration used in our simulations to generate the profiles of discrete dopants.
Keywords :
Green´s function methods; MOSFET; Poisson equation; effective mass; electrical resistivity; elemental semiconductors; nanowires; semiconductor doping; silicon; Poisson equation; Si; dopant concentration; dopant profile; effective mass approximation; full 3D nonequilibrium Green function; resistance; resistivity; thin silicon nanowire transistor; wrap-around gate MOSFET; Conductivity; Doping; Effective mass; Electrostatics; Green function; MOSFET circuits; Poisson equations; Schrodinger equation; Silicon; Wires;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices, 2009. CDE 2009. Spanish Conference on
Conference_Location :
Santiago de Compostela
Print_ISBN :
978-1-4244-2838-0
Electronic_ISBN :
978-1-4244-2839-7
Type :
conf
DOI :
10.1109/SCED.2009.4800522
Filename :
4800522
Link To Document :
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