DocumentCode
2978273
Title
Investigation of resistance in n-doped Si wires using NEGF formalism
Author
Martinez, Antonio ; Brown, Andrew ; Asenov, Asen ; Seoane, Natalia
Author_Institution
Univ. of Glasgow, Glasgow
fYear
2009
fDate
11-13 Feb. 2009
Firstpage
416
Lastpage
419
Abstract
In this work we use a full 3D Non-Equilibrium Green Function formalism in the effective mass approximation to calculate the resistance and resistivity of a thin silicon nanowire transistor and a doped silicon nanowire. The Non-Equilibrium green function equations are solved self-consistent with the Poisson equation. The resistances are calculated by averaging the resulting currents from an ensemble of wires and transistors. The number and spatial location of the discrete dopants differ for each device in the ensemble. The calculated resistivities agree with the bulk resistivity corresponding to the average dopant concentration used in our simulations to generate the profiles of discrete dopants.
Keywords
Green´s function methods; MOSFET; Poisson equation; effective mass; electrical resistivity; elemental semiconductors; nanowires; semiconductor doping; silicon; Poisson equation; Si; dopant concentration; dopant profile; effective mass approximation; full 3D nonequilibrium Green function; resistance; resistivity; thin silicon nanowire transistor; wrap-around gate MOSFET; Conductivity; Doping; Effective mass; Electrostatics; Green function; MOSFET circuits; Poisson equations; Schrodinger equation; Silicon; Wires;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices, 2009. CDE 2009. Spanish Conference on
Conference_Location
Santiago de Compostela
Print_ISBN
978-1-4244-2838-0
Electronic_ISBN
978-1-4244-2839-7
Type
conf
DOI
10.1109/SCED.2009.4800522
Filename
4800522
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