Title :
Monte-Carlo method in AFM calibration
Author :
González-Jorge, H. ; Valencia, J.L. ; Alvarez, V. ; Rodríguez, F. ; Yebra, F.J.
Author_Institution :
LOMG, Ourense
Abstract :
Surface measurements made using atomic force microscopy are one of the most important fields in quality control for the semiconductor industry. Uncertainty is typically estimated using complicated model functions and Monte-Carlo method appears very interesting for making these calculations easily and non-assuming the linearity of the functions. This procedure was checked by the calibration of transfer standards in lateral and vertical directions. Results show its capability for the calculation and are in agreement with the Central Limit Theorem for trials over 10.000.
Keywords :
Monte Carlo methods; atomic force microscopy; measurement uncertainty; quality control; semiconductor industry; surface topography measurement; AFM calibration; Central Limit Theorem; Monte-Carlo method; atomic force microscopy; quality control; semiconductor industry; surface measurement; uncertainty evaluation; Atomic force microscopy; Atomic measurements; Calibration; Electronics industry; Force measurement; Hysteresis; Instruments; Mathematical model; Quality control; Uncertainty;
Conference_Titel :
Electron Devices, 2009. CDE 2009. Spanish Conference on
Conference_Location :
Santiago de Compostela
Print_ISBN :
978-1-4244-2838-0
Electronic_ISBN :
978-1-4244-2839-7
DOI :
10.1109/SCED.2009.4800526
