• DocumentCode
    2978361
  • Title

    Surface Passivation Effect of Electron-Beam Resist on InAs Quantum Dots and Their Improved Luminescence Efficiency

  • Author

    Idutsu, Y. ; Hayashi, Y. ; Endo, M. ; Uesugi, K. ; Suemune, I.

  • Author_Institution
    Hokkaido Univ., Sapporo
  • fYear
    2007
  • fDate
    14-18 May 2007
  • Firstpage
    285
  • Lastpage
    288
  • Abstract
    Surface passivation effect of electron-beam resist (EBR) on InAs quantum dots (QDs) was studied to fabricate nano devices based on QDs open to air. When polymethylmethacrylate (PMMA) was coated on InAs QD surfaces, the luminescence spectra and efficiencies were stably preserved for more than months. On the other hand, other EBRs such as ZEP or SAL were coated, photoluminescence (PL) efficiencies were decreased and the modification of QD structures were observed after the removal of EBRs. The enhancement or suppression of PL intensities was observed depending on the coated EBR thicknesses, which was attributed to the multiple optical reflection effect of emitted photons within the transparent EBR layers.
  • Keywords
    III-V semiconductors; indium compounds; passivation; photoluminescence; semiconductor quantum dots; InAs; electron-beam resist; luminescence efficiency; luminescence spectra; multiple optical reflection; photoluminescence efficiencies; polymethylmethacrylate; quantum dots; surface passivation effect; Capacitive sensors; Gallium arsenide; Luminescence; Optical sensors; Optical surface waves; Passivation; Quantum computing; Quantum dots; Resists; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide & Related Materials, 2007. IPRM '07. IEEE 19th International Conference on
  • Conference_Location
    Matsue
  • ISSN
    1092-8669
  • Print_ISBN
    1-4244-0875-X
  • Electronic_ISBN
    1092-8669
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2007.381179
  • Filename
    4265936