DocumentCode
2978361
Title
Surface Passivation Effect of Electron-Beam Resist on InAs Quantum Dots and Their Improved Luminescence Efficiency
Author
Idutsu, Y. ; Hayashi, Y. ; Endo, M. ; Uesugi, K. ; Suemune, I.
Author_Institution
Hokkaido Univ., Sapporo
fYear
2007
fDate
14-18 May 2007
Firstpage
285
Lastpage
288
Abstract
Surface passivation effect of electron-beam resist (EBR) on InAs quantum dots (QDs) was studied to fabricate nano devices based on QDs open to air. When polymethylmethacrylate (PMMA) was coated on InAs QD surfaces, the luminescence spectra and efficiencies were stably preserved for more than months. On the other hand, other EBRs such as ZEP or SAL were coated, photoluminescence (PL) efficiencies were decreased and the modification of QD structures were observed after the removal of EBRs. The enhancement or suppression of PL intensities was observed depending on the coated EBR thicknesses, which was attributed to the multiple optical reflection effect of emitted photons within the transparent EBR layers.
Keywords
III-V semiconductors; indium compounds; passivation; photoluminescence; semiconductor quantum dots; InAs; electron-beam resist; luminescence efficiency; luminescence spectra; multiple optical reflection; photoluminescence efficiencies; polymethylmethacrylate; quantum dots; surface passivation effect; Capacitive sensors; Gallium arsenide; Luminescence; Optical sensors; Optical surface waves; Passivation; Quantum computing; Quantum dots; Resists; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide & Related Materials, 2007. IPRM '07. IEEE 19th International Conference on
Conference_Location
Matsue
ISSN
1092-8669
Print_ISBN
1-4244-0875-X
Electronic_ISBN
1092-8669
Type
conf
DOI
10.1109/ICIPRM.2007.381179
Filename
4265936
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