• DocumentCode
    2978540
  • Title

    Quinary TlGaInNAs DQW Structures: Effect of Growth Temperature and Growth Rate on Tl Incorporation

  • Author

    Krishnamurthy, D. ; Fujiwara, A. ; Hasegawa, S. ; Asahi, H.

  • Author_Institution
    Osaka Univ., Osaka
  • fYear
    2007
  • fDate
    14-18 May 2007
  • Firstpage
    327
  • Lastpage
    330
  • Abstract
    TIGalnNAs-based DQW structures grown at various growth parameters were studied by secondary ion mass spectroscopy (SIMS). Enhanced Tl incorporation could be obtained using TlGaNAs barriers. A direct relationship between the Tl incorporation and N composition is clearly established by the analysis of the effect of growth temperature, growth rate, ECR power and nitrogen flow rate. The Tl incorporation increased with the increase of Tl flux in the case of DQW structures with TlGaAs barriers. In the case of DQW structures with TIGaNAs barriers, the Tl incorporation reached saturation at some Tl flux, indicating the N enhanced higher Tl incorporation.
  • Keywords
    secondary ion mass spectroscopy; semiconductor growth; semiconductor quantum wells; ternary semiconductors; thallium compounds; SIMS; Tl incorporation; TlGaNAs; TlGaNAs barriers; growth rate; growth temperature; quinary TIGalnNAs DQW structures; secondary ion mass spectroscopy; semiconductor quantum wells; Conference proceedings; Gallium arsenide; Indium phosphide; Light emitting diodes; Mass spectroscopy; Nitrogen; Sputtering; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide & Related Materials, 2007. IPRM '07. IEEE 19th International Conference on
  • Conference_Location
    Matsue
  • ISSN
    1092-8669
  • Print_ISBN
    1-4244-0875-X
  • Electronic_ISBN
    1092-8669
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2007.381190
  • Filename
    4265947