DocumentCode
2978540
Title
Quinary TlGaInNAs DQW Structures: Effect of Growth Temperature and Growth Rate on Tl Incorporation
Author
Krishnamurthy, D. ; Fujiwara, A. ; Hasegawa, S. ; Asahi, H.
Author_Institution
Osaka Univ., Osaka
fYear
2007
fDate
14-18 May 2007
Firstpage
327
Lastpage
330
Abstract
TIGalnNAs-based DQW structures grown at various growth parameters were studied by secondary ion mass spectroscopy (SIMS). Enhanced Tl incorporation could be obtained using TlGaNAs barriers. A direct relationship between the Tl incorporation and N composition is clearly established by the analysis of the effect of growth temperature, growth rate, ECR power and nitrogen flow rate. The Tl incorporation increased with the increase of Tl flux in the case of DQW structures with TlGaAs barriers. In the case of DQW structures with TIGaNAs barriers, the Tl incorporation reached saturation at some Tl flux, indicating the N enhanced higher Tl incorporation.
Keywords
secondary ion mass spectroscopy; semiconductor growth; semiconductor quantum wells; ternary semiconductors; thallium compounds; SIMS; Tl incorporation; TlGaNAs; TlGaNAs barriers; growth rate; growth temperature; quinary TIGalnNAs DQW structures; secondary ion mass spectroscopy; semiconductor quantum wells; Conference proceedings; Gallium arsenide; Indium phosphide; Light emitting diodes; Mass spectroscopy; Nitrogen; Sputtering; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide & Related Materials, 2007. IPRM '07. IEEE 19th International Conference on
Conference_Location
Matsue
ISSN
1092-8669
Print_ISBN
1-4244-0875-X
Electronic_ISBN
1092-8669
Type
conf
DOI
10.1109/ICIPRM.2007.381190
Filename
4265947
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