DocumentCode :
2978800
Title :
AlAs/GaAs/GaP Heterostructure Nanowires Grown on Si Substrate
Author :
Zhang, G. ; Tateno, K. ; Sanada, H. ; Sogawa, T. ; Nakano, H.
Author_Institution :
NTT Corp., Kanagawa
fYear :
2007
fDate :
14-18 May 2007
Firstpage :
388
Lastpage :
391
Abstract :
The growth of GaP and AlAs/GaAs/GaP heterostructure nanowires on Si using Au colloids as catalysts was investigated. For GaP nanowire growth, we found an epitaxial relationship between the GaP nanowires and Si substrate. The AlAs/GaAs/GaP heterostructure nanowires were found to grow vertically on Si. Structural analysis indicates that the hetero-interfaces are within several atomic layers in thickness and that the GaAs and AlAs segments have very few dislocations.
Keywords :
aluminium compounds; catalysts; colloids; dislocations; gallium arsenide; gallium compounds; nanowires; semiconductor epitaxial layers; semiconductor growth; semiconductor heterojunctions; AlAs-GaAs-GaP; Si; atomic layers; catalysts; colloids; dislocations; epitaxial growth; heterostructure nanowire growth; structural analysis; Epitaxial growth; Gallium arsenide; Gold; Lattices; Nanoscale devices; Nanowires; Scanning electron microscopy; Semiconductor materials; Substrates; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide & Related Materials, 2007. IPRM '07. IEEE 19th International Conference on
Conference_Location :
Matsue
ISSN :
1092-8669
Print_ISBN :
1-4244-0875-X
Electronic_ISBN :
1092-8669
Type :
conf
DOI :
10.1109/ICIPRM.2007.381205
Filename :
4265962
Link To Document :
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