DocumentCode :
2979610
Title :
Emission of Electrons in InAs Quantum Dot Memory Devices Studied by Drain-Current Deep Level Transient Spectroscopy
Author :
Ooike, Noboru ; Motohisa, Junichi ; Fukui, Takashi
Author_Institution :
Hokkaido Univ., Sapporo
fYear :
2007
fDate :
14-18 May 2007
Firstpage :
567
Lastpage :
570
Abstract :
We studied emission process of electrons in InAs quantum dot (QD) memory devices by means of drain-current deep level transient spectroscopy (DLTS). The GaAs narrow-wire field effect transistors with a few InAs QDs above the channel were fabricated by selective-area metal organic vapor-phase epitaxy. The drain current, measured by sweeping the gate voltage forward and backward, exhibited clear clock-wise hysteresis due to charging of electrons into the states induced by InAs QDs with a threshold voltage shift (DeltaVth) of 30 mV at 20 K. Peaks representing three kinds of electron traps concerning InAs QDs were observed in the DLTS spectra. These peaks exhibited different dependences on the applied gate pulsed voltage during the DLTS measurement. In comparison with the temperature dependence of DeltaVth, we found that our memory operation was attributed to one localized state introduced by InAs QDs.
Keywords :
III-V semiconductors; MOCVD; deep level transient spectroscopy; electron emission; field effect memory circuits; gallium arsenide; indium compounds; semiconductor quantum dots; vapour phase epitaxial growth; DLTS measurement; GaAs; GaAs narrow-wire field effect transistors; InAs; clock-wise hysteresis; drain current; drain-current deep level transient spectroscopy; electron traps; electrons emission process; gate voltage forward sweeping; localized state; quantum dot memory devices; selective-area metal organic vapor-phase epitaxy; temperature 20 K; threshold voltage shift; voltage 30 mV; Clocks; Current measurement; Electron emission; Epitaxial growth; FETs; Gallium arsenide; Pulse measurements; Quantum dots; Spectroscopy; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide & Related Materials, 2007. IPRM '07. IEEE 19th International Conference on
Conference_Location :
Matsue
ISSN :
1092-8669
Print_ISBN :
1-4244-0875-X
Electronic_ISBN :
1092-8669
Type :
conf
DOI :
10.1109/ICIPRM.2007.381254
Filename :
4266011
Link To Document :
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