• DocumentCode
    2979864
  • Title

    Capabilities of existing lithography tools

  • Author

    Van Peski, Chris

  • Author_Institution
    SEMATECH, Austin, TX, USA
  • fYear
    1997
  • fDate
    13-15 Oct 1997
  • Firstpage
    346
  • Lastpage
    348
  • Abstract
    Lithography tools are key to meeting the requirements of the SIA Roadmap. Current generation tools are meeting the technical requirements of the 0.25 um technology, but challenges remain for the future generation
  • Keywords
    lithography; 0.25 micron; SIA Roadmap; lithography tools; Cleaning; Coatings; Delay effects; Lithography; Metrology; Nonlinear distortion; Optical distortion; Production; Resists; Thermal resistance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics Manufacturing Technology Symposium, 1997., Twenty-First IEEE/CPMT International
  • Conference_Location
    Austin, TX
  • ISSN
    1089-8190
  • Print_ISBN
    0-7803-3929-0
  • Type

    conf

  • DOI
    10.1109/IEMT.1997.626942
  • Filename
    626942
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2979864