DocumentCode :
2979864
Title :
Capabilities of existing lithography tools
Author :
Van Peski, Chris
Author_Institution :
SEMATECH, Austin, TX, USA
fYear :
1997
fDate :
13-15 Oct 1997
Firstpage :
346
Lastpage :
348
Abstract :
Lithography tools are key to meeting the requirements of the SIA Roadmap. Current generation tools are meeting the technical requirements of the 0.25 um technology, but challenges remain for the future generation
Keywords :
lithography; 0.25 micron; SIA Roadmap; lithography tools; Cleaning; Coatings; Delay effects; Lithography; Metrology; Nonlinear distortion; Optical distortion; Production; Resists; Thermal resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics Manufacturing Technology Symposium, 1997., Twenty-First IEEE/CPMT International
Conference_Location :
Austin, TX
ISSN :
1089-8190
Print_ISBN :
0-7803-3929-0
Type :
conf
DOI :
10.1109/IEMT.1997.626942
Filename :
626942
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2979864
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