DocumentCode :
2980505
Title :
Quasi three-section CAD model for MODFETs
Author :
Kim, Young M. ; Martin, Harold L. ; Kim, Jung H. ; Roblin, Patrick
Author_Institution :
Dept. of Electr. Eng., North Carolina A&T State Univ., Greensboro, NC, USA
fYear :
1988
fDate :
11-13 Apr 1988
Firstpage :
344
Lastpage :
348
Abstract :
A purely analytical model for MODFETs based on two-dimensional device simulation is proposed. In this model, proper treatment of the diffusion effect in two-dimensional electron gas (2-DEG) transport due to the gradual channel opening along the 2-DEG channel was used to explain the enhanced mobility and increased threshold voltage. By introducing the finite channel opening and an effective channel-length modulation, the slope of the saturation region of the I-V curves was modeled. The smooth transition of the I-V curves from linear-to-saturation region of the I-V curves was possible using the continuous Troffimenkoff-type of field-dependent mobility. A correction factor f was introduced to account for the finite transition section forming between the GCA and the saturated section. This factor removes the large discrepancies in the saturation region of the I-V curves predicted by previous one-dimensional models
Keywords :
circuit CAD; circuit analysis computing; electron mobility; high electron mobility transistors; semiconductor device models; HEMTs; MODFETs; analytical model; channel-length modulation; diffusion effect; gradual channel opening; mobility; quasi three section CAD model; saturation region; threshold voltage; two-dimensional device simulation; Analytical models; Electron mobility; Fabrication; Gallium arsenide; HEMTs; MESFETs; MODFETs; Predictive models; Random access memory; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Southeastcon '88., IEEE Conference Proceedings
Conference_Location :
Knoxville, TN
Type :
conf
DOI :
10.1109/SECON.1988.194874
Filename :
194874
Link To Document :
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