DocumentCode :
2980663
Title :
Plasma waves excitation in the base of lateral hot electron transistor
Author :
Fedichkin, Leonid ; Ryzhii, Victor ; Willander, Magnus
Author_Institution :
Comput. Solid State Phys. Lab., Aizu Univ., Fukushima, Japan
fYear :
1998
fDate :
12-13 Mar 1998
Firstpage :
83
Lastpage :
87
Abstract :
Lateral hot-electron transistors (LHETs) attracts great attention as a possible basis for high frequency (HF) microelectronics. In contrast to previous work the excitation of plasma waves with a linear dispersion law in the LHET base is taken into account. It is shown that plasma effects can play an important role in LHET operation. We propose to induce plasma waves in the base of LHET by the input a.c. voltage. The resonant behaviour of transistor parameters allows us to call it as Resonant Lateral Hot electron Transistor (RLHET). By generalizing Dyakonov-Shur approach we succeeded to obtain analytical expression for LHET transconductance accounting plasma oscillations. It is shown that the emitter current of such a device has a resonant response to the applied HF base voltage determined by the standing plasma waves resonances of 2DEG in the base, which can be in the terahertz range, depending on the base length. The resonant transconductance can significantly exceed its steady state value. This device can be used both for the experimental study of 2DEG parameters and as a selective, tunable HF amplifier
Keywords :
hot electron transistors; semiconductor plasma; two-dimensional electron gas; 2DEG; Dyakonov-Shur model; RLHET; dispersion law; high frequency microelectronics; lateral hot electron transistor; plasma oscillation; plasma wave; resonant transconductance; Electrons; Frequency; Hafnium; Microelectronics; Plasma devices; Plasma waves; Resonance; Steady-state; Transconductance; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Physics and Modeling of Devices Based on Low-Dimensional Structures, 1998. Proceedings., Second International Workshop on
Conference_Location :
Aizu-Wakamatsu
Print_ISBN :
0-8186-8682-0
Type :
conf
DOI :
10.1109/LDS.1998.714539
Filename :
714539
Link To Document :
بازگشت