• DocumentCode
    2980663
  • Title

    Plasma waves excitation in the base of lateral hot electron transistor

  • Author

    Fedichkin, Leonid ; Ryzhii, Victor ; Willander, Magnus

  • Author_Institution
    Comput. Solid State Phys. Lab., Aizu Univ., Fukushima, Japan
  • fYear
    1998
  • fDate
    12-13 Mar 1998
  • Firstpage
    83
  • Lastpage
    87
  • Abstract
    Lateral hot-electron transistors (LHETs) attracts great attention as a possible basis for high frequency (HF) microelectronics. In contrast to previous work the excitation of plasma waves with a linear dispersion law in the LHET base is taken into account. It is shown that plasma effects can play an important role in LHET operation. We propose to induce plasma waves in the base of LHET by the input a.c. voltage. The resonant behaviour of transistor parameters allows us to call it as Resonant Lateral Hot electron Transistor (RLHET). By generalizing Dyakonov-Shur approach we succeeded to obtain analytical expression for LHET transconductance accounting plasma oscillations. It is shown that the emitter current of such a device has a resonant response to the applied HF base voltage determined by the standing plasma waves resonances of 2DEG in the base, which can be in the terahertz range, depending on the base length. The resonant transconductance can significantly exceed its steady state value. This device can be used both for the experimental study of 2DEG parameters and as a selective, tunable HF amplifier
  • Keywords
    hot electron transistors; semiconductor plasma; two-dimensional electron gas; 2DEG; Dyakonov-Shur model; RLHET; dispersion law; high frequency microelectronics; lateral hot electron transistor; plasma oscillation; plasma wave; resonant transconductance; Electrons; Frequency; Hafnium; Microelectronics; Plasma devices; Plasma waves; Resonance; Steady-state; Transconductance; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Physics and Modeling of Devices Based on Low-Dimensional Structures, 1998. Proceedings., Second International Workshop on
  • Conference_Location
    Aizu-Wakamatsu
  • Print_ISBN
    0-8186-8682-0
  • Type

    conf

  • DOI
    10.1109/LDS.1998.714539
  • Filename
    714539