Experimental verification of Single Event interconnect crosstalk in a 90 nm CMOS technology

The presence of Single Event (SE) interconnect crosstalk has been demonstrated experimentally in the IBM 90 nm CMOS9SF process. Single and Two Photon pulsed laser experiments were performed to demonstrate this phenomenon. 3D mixed-mode simulations and modeling show SE interconnect crosstalk to depend on the interconnect length and on the amount of deposited charge. Simulations have been performed at the dual operating voltages used in this technology. Experimental and accompanying simulation results show this effect to increase SE susceptibility by increasing the vulnerable area and require evaluation to assure expected hardness levels.