DocumentCode :
2982165
Title :
Current-carrying Capacity of Long & Short Channel 2D Graphene Transistors
Author :
Luo, X. ; Lee, Y. ; Konar, A. ; Fang, T. ; Xing, H. ; Snider, G. ; Jena, D.
Author_Institution :
Dept. of Electr. Eng., Univ. of Notre Dame, Notre Dame, IN
fYear :
2008
fDate :
23-25 June 2008
Firstpage :
29
Lastpage :
30
Abstract :
The fundamental current-carrying capacity of graphene is found to be much higher than tradiational FETs (MOSFETs, pHEMTs, etc), matched only by the I-V nitride HEMTs. Currently, the device structures investigated are rather primitive and do not allow for efficient heat removal - similar effects were observed for CNTs a decade ago. However, with top-gate technology (for high 2D carrier densities with smaller gate voltages), efficient heat removal (to prevent burnout), and improvement of the purity levels of the gate dielectrics (to achieve current saturation at lower biases and thus less heat due to IdsxVds product lowering), 2D graphene and GNR based FETs can be expected to surpass most traditional (non-nitride) FETs in their current-carrying capacity.
Keywords :
MOSFET; graphene; high electron mobility transistors; 2D carrier densities; 2D graphene transistors; C; MOSFET; current-carrying capacity; heat removal; pHEMT; top-gate technology; Annealing; Charge carrier density; Conductivity measurement; Current density; Etching; FETs; HEMTs; MODFETs; Optical saturation; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 2008
Conference_Location :
Santa Barbara, CA
ISSN :
1548-3770
Print_ISBN :
978-1-4244-1942-5
Electronic_ISBN :
1548-3770
Type :
conf
DOI :
10.1109/DRC.2008.4800722
Filename :
4800722
Link To Document :
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