• DocumentCode
    2982923
  • Title

    Optically Induced Series Resistance and Microwave Properties of n+ np+ GaAs and Si IMPATT Diode

  • Author

    De, P.

  • Author_Institution
    Univ. of Calcutta, Kolkata
  • fYear
    2007
  • fDate
    18-21 April 2007
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    The effect of laser radiation on the n+ side of the n+np+ semiconductor junction structure of GaAs and Si IMPATT diode at X band has been studied. Following Gummel-Blue approach (1967) and considering the experimental ionization parameters of GaAs (Groves et al., 2003) and Si (Grant, 1973), the present study predicts that the enhancement of optically induced leakage current increases the value of crucial series resistance with an overall degradation in the microwave negative resistance properties, but with an advantage of wider tuning range at 22 C of the diode. It is also observed that GaAs diode yields lower values of series resistance and higher values of negative conductance than its Si IMPATT counterpart at X band.
  • Keywords
    IMPATT diodes; gallium arsenide; ionisation; radiation effects; semiconductor junctions; silicon; GaAs; IMPATT diode; Si; ionization parameters; laser radiation; microwave negative resistance properties; optically induced series resistance; semiconductor junction; Charge carrier processes; Conductivity; Electromagnetic heating; Gallium arsenide; Ionization; Leakage current; Optical saturation; Semiconductor diodes; Thermal degradation; Thermal resistance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave and Millimeter Wave Technology, 2007. ICMMT '07. International Conference on
  • Conference_Location
    Builin
  • Print_ISBN
    1-4244-1049-5
  • Electronic_ISBN
    1-4244-1049-5
  • Type

    conf

  • DOI
    10.1109/ICMMT.2007.381429
  • Filename
    4266188