DocumentCode
2982923
Title
Optically Induced Series Resistance and Microwave Properties of n+ np+ GaAs and Si IMPATT Diode
Author
De, P.
Author_Institution
Univ. of Calcutta, Kolkata
fYear
2007
fDate
18-21 April 2007
Firstpage
1
Lastpage
4
Abstract
The effect of laser radiation on the n+ side of the n+np+ semiconductor junction structure of GaAs and Si IMPATT diode at X band has been studied. Following Gummel-Blue approach (1967) and considering the experimental ionization parameters of GaAs (Groves et al., 2003) and Si (Grant, 1973), the present study predicts that the enhancement of optically induced leakage current increases the value of crucial series resistance with an overall degradation in the microwave negative resistance properties, but with an advantage of wider tuning range at 22 C of the diode. It is also observed that GaAs diode yields lower values of series resistance and higher values of negative conductance than its Si IMPATT counterpart at X band.
Keywords
IMPATT diodes; gallium arsenide; ionisation; radiation effects; semiconductor junctions; silicon; GaAs; IMPATT diode; Si; ionization parameters; laser radiation; microwave negative resistance properties; optically induced series resistance; semiconductor junction; Charge carrier processes; Conductivity; Electromagnetic heating; Gallium arsenide; Ionization; Leakage current; Optical saturation; Semiconductor diodes; Thermal degradation; Thermal resistance;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave and Millimeter Wave Technology, 2007. ICMMT '07. International Conference on
Conference_Location
Builin
Print_ISBN
1-4244-1049-5
Electronic_ISBN
1-4244-1049-5
Type
conf
DOI
10.1109/ICMMT.2007.381429
Filename
4266188
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