• DocumentCode
    2983081
  • Title

    GaN-based HFET Design for Ultra-high frequency Operation

  • Author

    Koudymov, Alexei ; Shur, Michael

  • Author_Institution
    Dept. of Electr., Rensselaer Polytech. Inst., Troy, NY
  • fYear
    2008
  • fDate
    23-25 June 2008
  • Firstpage
    125
  • Lastpage
    126
  • Abstract
    In this paper, a new approach is proposed for optimizing the design of GaN-based HFETs for ultra high frequency operation. The key features of the ultra high frequency design include recessed gate MOSHFET .This approach is based on our analytical model that accounts for the electric field and potential distribution outside the gated region. It is concluded that, GaN HFETs should be able to reach ultrahigh frequency performance at least comparable to that of InGaAs based HFET but at a much higher power levels. However, this will require new designs with quaternary buffers, very high electron sheet density in the gate-to-drain spacing, and precise gate-to-drain distance control.
  • Keywords
    III-V semiconductors; MOSFET; gallium compounds; high electron mobility transistors; millimetre wave transistors; semiconductor device models; submillimetre wave transistors; wide band gap semiconductors; GaN; electric field distribution; electric potential distribution; gallium nitride-based HFET design; gate-to-drain distance control; gate-to-drain spacing; high electron sheet density; recessed gate MOSHFET; ultra high frequency FET performance; Analytical models; Design optimization; Electric potential; Electrons; Frequency; Gallium nitride; HEMTs; Indium gallium arsenide; MODFETs; MOSHFETs;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference, 2008
  • Conference_Location
    Santa Barbara, CA
  • ISSN
    1548-3770
  • Print_ISBN
    978-1-4244-1942-5
  • Electronic_ISBN
    1548-3770
  • Type

    conf

  • DOI
    10.1109/DRC.2008.4800766
  • Filename
    4800766