DocumentCode
2983081
Title
GaN-based HFET Design for Ultra-high frequency Operation
Author
Koudymov, Alexei ; Shur, Michael
Author_Institution
Dept. of Electr., Rensselaer Polytech. Inst., Troy, NY
fYear
2008
fDate
23-25 June 2008
Firstpage
125
Lastpage
126
Abstract
In this paper, a new approach is proposed for optimizing the design of GaN-based HFETs for ultra high frequency operation. The key features of the ultra high frequency design include recessed gate MOSHFET .This approach is based on our analytical model that accounts for the electric field and potential distribution outside the gated region. It is concluded that, GaN HFETs should be able to reach ultrahigh frequency performance at least comparable to that of InGaAs based HFET but at a much higher power levels. However, this will require new designs with quaternary buffers, very high electron sheet density in the gate-to-drain spacing, and precise gate-to-drain distance control.
Keywords
III-V semiconductors; MOSFET; gallium compounds; high electron mobility transistors; millimetre wave transistors; semiconductor device models; submillimetre wave transistors; wide band gap semiconductors; GaN; electric field distribution; electric potential distribution; gallium nitride-based HFET design; gate-to-drain distance control; gate-to-drain spacing; high electron sheet density; recessed gate MOSHFET; ultra high frequency FET performance; Analytical models; Design optimization; Electric potential; Electrons; Frequency; Gallium nitride; HEMTs; Indium gallium arsenide; MODFETs; MOSHFETs;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference, 2008
Conference_Location
Santa Barbara, CA
ISSN
1548-3770
Print_ISBN
978-1-4244-1942-5
Electronic_ISBN
1548-3770
Type
conf
DOI
10.1109/DRC.2008.4800766
Filename
4800766
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