Title :
Use of Highly Reflective Ohmic Contact and Surface KrF Laser Roughening to Improve Light Output of Vertical GaN-Based Light-Emitting Diodes
Author :
Lee, Wei-Chi ; Uang, Kai-Ming ; Kuo, Der-Ming ; Chou, Jui-Chiang ; Chen, Tron-Min ; Kuo, Hon-Yi ; Wang, Shui-Jinn
Author_Institution :
Dept. of Electr. Eng., Nat. Cheng Kung Univ., Tainan
Abstract :
A highly reflective ohmic contact and surface roughening by KrF excimer laser technique to improve the optoelectronic properties of high-power vertical metallic-substrate GaN-based light-emitting diodes (VM-LEDs) were proposed and investigated. A metal system comprising of Ni/Ag/Ni was employed to serve as a reflector and ohmic contact to p-GaN, which exhibits a good ohmic contact (3.05times10-4 Omega cm2) and high reflectivity (89% at the wavelength of 465 nm) after thermal annealing at 500degC in N2 ambient for 10 min. After the removal of sapphire using laser lift-off process (LLO), KrF excimer laser irradiation was adopted to etch the u-GaN layer and then roughen the surface of the exposed n-GaN layer. As compared to regular lateral-structure GaN-based LEDs with ITO transparent conduction layer (TCL), the fabricated VM-LEDs with a chip size of 1000 mumtimes1000 mum demonstrated a typical increase in light output power (Lop) (i. e., DeltaLop/Lop) by 325.5% at 350 mA with a decrease in forward voltage (Vf) from 3.67 V down to 3.41 V. As compared to the VM-LEDs with u-GaN etching employing inductively coupled plasma, about 125% enhancement in Lop has been obtained at 350 mA from the proposed samples.
Keywords :
III-V semiconductors; annealing; excimer lasers; gallium compounds; light emitting diodes; nickel; ohmic contacts; silver; surface roughness; wide band gap semiconductors; GaN; KrF excimer laser irradiation; Ni-Ag-Ni; current 350 mA; highly reflective ohmic contact; laser lift-off process; light-emitting diodes; optoelectronic properties; surface KrF laser roughening; temperature 500 degC; thermal annealing; time 10 min; transparent conduction layer; wavelength 465 nm; Annealing; Etching; Indium tin oxide; Light emitting diodes; Ohmic contacts; Reflectivity; Rough surfaces; Surface emitting lasers; Surface roughness; Vertical cavity surface emitting lasers;
Conference_Titel :
Device Research Conference, 2008
Conference_Location :
Santa Barbara, CA
Print_ISBN :
978-1-4244-1942-5
Electronic_ISBN :
1548-3770
DOI :
10.1109/DRC.2008.4800774