DocumentCode :
2983511
Title :
Subthreshold Performance of Double-gate Accumulation-mode P-channel SOI MOSFET
Author :
Zhengfan, Zhang ; Li Zhaoji ; Kaizhou, Tan ; Jiabin, Zhang ; Kaicheng, Li
Author_Institution :
Univ. of Electron. Sci. & Technol. of China, Chengdu
fYear :
2007
fDate :
18-21 April 2007
Firstpage :
1
Lastpage :
4
Abstract :
In this paper, an analytical model of subthreshold swing for the double-gate accumulation-mode P-channel SOI MOSFET is described. The model is based on Poisson´s equation and depletion approximation, and the relation of the subthreshold swing with both the gate oxide capacitance and the interface trap density is obtained. The model is verified by experiment and by numerical simulation. Also an approach to extracting the interface trap density with subthreshold swing is proposed.
Keywords :
MOSFET; Poisson equation; semiconductor device models; silicon-on-insulator; Poisson equation; Si-SiO2; depletion approximation; double-gate accumulation-mode P-channel SOI MOSFET; gate oxide capacitance; interface trap density; subthreshold swing; Analytical models; Application specific integrated circuits; Equations; Integrated circuit technology; Isolation technology; MOSFET circuits; Numerical simulation; Parasitic capacitance; Radiation hardening; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave and Millimeter Wave Technology, 2007. ICMMT '07. International Conference on
Conference_Location :
Builin
Print_ISBN :
1-4244-1049-5
Electronic_ISBN :
1-4244-1049-5
Type :
conf
DOI :
10.1109/ICMMT.2007.381457
Filename :
4266216
Link To Document :
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