DocumentCode :
2983669
Title :
Scaling properties of (111) InAs Nanowire MOSFETs
Author :
Lind, Erik ; Persson, Martin P. ; Thelander, Claes ; Niquet, Yann-Michel ; Samuelson, Lars ; Wernersson, Lars-Erik
Author_Institution :
Dept. of Solid State Phys., Lund Univ., Lund
fYear :
2008
fDate :
23-25 June 2008
Firstpage :
179
Lastpage :
180
Abstract :
Ill-V nanowire MOSFETs are currently under consideration for scaling beyond the 22 nm node. For a 50 nm diameter (111) InAs MOSFETs with a 50 nm long gate, we have shown a maximum transconductance of 0.8 S/mm and a drive current of 0.65 A/mm. We here investigate how the InAs MOSFET drive current behaves when the gate length is scaled down into the sub 10 nm regime. In order to achieve good control of the device electrostatics, the channel thickness (nanowire diameter) needs to be scaled as the gate length of the transistor is scaled. For a cylindrical nanowire gate geometry, simple modeling indicates that the wire diameter should be similar to the gate length. The wire diameter thus also needs to be scaled to the nm regime.
Keywords :
III-V semiconductors; MOSFET; electrostatics; indium compounds; nanowires; (111) InAs; InAs; channel thickness; cylindrical nanowire gate geometry; device electrostatics; maximum transconductance; nanowire MOSFET drive current; Dispersion; Geometry; MOSFETs; Parasitic capacitance; Physics; Quantum capacitance; Solid modeling; Solid state circuits; Transconductance; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 2008
Conference_Location :
Santa Barbara, CA
ISSN :
1548-3770
Print_ISBN :
978-1-4244-1942-5
Electronic_ISBN :
1548-3770
Type :
conf
DOI :
10.1109/DRC.2008.4800792
Filename :
4800792
Link To Document :
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