DocumentCode
2983755
Title
Fabrication of a MEMS-Based Cobra Probe
Author
Huang, Jung-Tang ; Hsu, Hou-Jun ; Chao, Pen-Shan ; Lee, Kuo-Yu ; Wu, Chan-Shoue ; Shih, Sheng-Hsiung ; Lin, Ming-Zhe ; Lee, Feng-Yue ; Lan, Zheng-Chang
Author_Institution
Nat. Taipei Univ. of Technol., Taipei
fYear
2007
fDate
20-22 Dec. 2007
Firstpage
809
Lastpage
812
Abstract
This study presents a new type of cobra probe by using MEMS technology for IC testing. The fabrication includes photolithography, electroforming and polishing process. Mechanical properties of the cobra probe are measured and no fracture or deformation is found after applying a force of 3 g for as many as 20,000 times. Its contact resistance averages nearly 680 mOmega and overdrive is approximately up to 30 um.
Keywords
contact resistance; electroforming; integrated circuit testing; micromechanical devices; photolithography; polishing; probes; IC testing; MEMS-based cobra probe; contact resistance; electroforming process; fabrication technology; photolithography process; polishing process; Contact resistance; Electrical resistance measurement; Fabrication; Force measurement; Integrated circuit testing; Lithography; Mechanical factors; Mechanical variables measurement; Micromechanical devices; Probes;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices and Solid-State Circuits, 2007. EDSSC 2007. IEEE Conference on
Conference_Location
Tainan
Print_ISBN
978-1-4244-0637-1
Electronic_ISBN
978-1-4244-0637-1
Type
conf
DOI
10.1109/EDSSC.2007.4450249
Filename
4450249
Link To Document