DocumentCode
2985631
Title
Development of SAW pressure sensor using ZnO/Si structure
Author
Talbi, A. ; Sarry, F. ; Le Brizoual, L. ; Elmazria, O. ; Alnot, P.
Author_Institution
Lab. de Phys. des Milieux Ionises et Applications, Univ. H. Poincare, Nancy, France
fYear
2004
fDate
23-27 Aug. 2004
Firstpage
566
Lastpage
570
Abstract
SAW devices have been shown to be suitable for many sensor applications. One of these applications is the pressure sensor. In this study, we present our ZnO deposition process. We also investigate the performance of SAW pressure sensors formed with a ZnO/Si(001) structure. The pressure sensitivities of the Rayleigh mode as well as the Sezawa mode are studied as a function of normalized thickness (kh=2πhZnO/λ). The experimental results show an opposite strain effect in the ZnO layer and Si substrate. A theoretical approach was developed to show the particle displacement. For a low khZnO value, the ZnO and Si medium contribute to the sensor sensitivity. For higher khZnO values, the particle displacement is mainly confined in the ZnO layer. This confirmed the opposite behaviors of the sensitivity with the khZnO value. Enhancement of the SAW sensitivity is also presented by the development of a pressure membrane based on the developed device.
Keywords
Rayleigh waves; membranes; pressure sensors; surface acoustic wave sensors; zinc compounds; Rayleigh mode pressure sensitivity; SAW pressure sensors; Sezawa mode; ZnO-Si; particle displacement; piezoelectric layer deposition process; pressure membrane; strain effects; Acoustic sensors; Argon; Capacitive sensors; Piezoelectric films; Sputtering; Substrates; Surface acoustic wave devices; Surface acoustic waves; X-ray scattering; Zinc oxide;
fLanguage
English
Publisher
ieee
Conference_Titel
Frequency Control Symposium and Exposition, 2004. Proceedings of the 2004 IEEE International
ISSN
1075-6787
Print_ISBN
0-7803-8414-8
Type
conf
DOI
10.1109/FREQ.2004.1418521
Filename
1418521
Link To Document