• DocumentCode
    298627
  • Title

    Comparison of diffusion length measurements from the flying spot technique and the photocarrier grating method in amorphous thin films

  • Author

    Vieira, M. ; Fantoni, A. ; Martins, R. ; Chu, V. ; Koynov, S. ; Wang, F. ; Grebner, S. ; Schwarz, R.

  • Author_Institution
    FCT-UNL/UNINOVA, Monte da Caparica, Portugal
  • Volume
    1
  • fYear
    1994
  • fDate
    5-9 Dec 1994
  • Firstpage
    575
  • Abstract
    Using the Flying Spot Technique (FST) we have studied minority carrier transport parallel and perpendicular to the surface of amorphous silicon films (a-Si:H). To reduce slow transients due to charge redistribution in low resistivity regions during the measurement we have applied a strong homogeneously absorbed bias light. The defect density was estimated from CPM measurements. The steady-state photocarrier grating technique (SSPG) is a 1-dimensional approach. However, the modulation depth of the carrier profile is also dependent on film surface properties, like surface recombination velocity. Both methods yield comparable diffusion lengths when applied to a-Si:H
  • Keywords
    amorphous semiconductors; carrier lifetime; elemental semiconductors; hydrogen; minority carriers; photoconductivity; semiconductor thin films; silicon; surface recombination; Si:H; a-Si:H; amorphous thin films; carrier profile; charge redistribution; defect density; diffusion length measurements; diffusion lengths; film surface properties; flying spot technique; minority carrier transport; modulation depth; photocarrier grating method; semiconductor; strong homogeneously absorbed bias light; surface recombination velocity; Amorphous materials; Conductivity; Gratings; Length measurement; Lighting; PIN photodiodes; Photoconductivity; Poisson equations; Semiconductor thin films; Steady-state;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Energy Conversion, 1994., Conference Record of the Twenty Fourth. IEEE Photovoltaic Specialists Conference - 1994, 1994 IEEE First World Conference on
  • Conference_Location
    Waikoloa, HI
  • Print_ISBN
    0-7803-1460-3
  • Type

    conf

  • DOI
    10.1109/WCPEC.1994.520026
  • Filename
    520026