DocumentCode :
2986619
Title :
Thickness of ruthenium oxide film produced by the surface deactivation treatment of ruthenium-plated contact reed switches
Author :
Yokokawa, T. ; Yano, T. ; Kawakita, C. ; Hinohara, K. ; Kobayashi, T.
Author_Institution :
Oki Electr. Ind. Co. Ltd., Tokyo, Japan
fYear :
1989
fDate :
18-20 Sep 1989
Firstpage :
177
Lastpage :
181
Abstract :
A precise analysis of ruthenium-plated contact surfaces was made to obtain information on the thickness of ruthenium oxide film. The thickness of ruthenium oxide film before and after high-temperature oxygen treatment was measured. As a result of investigation using ellipsometry and Auger electron spectroscopy, it was found that the thickness of ruthenium oxide film on the ruthenium-plated contact surface treated with oxygen at 450°C optimum treatment temperature is approximately 50 Å and that the thickness increases as treatment temperature rises
Keywords :
oxidation; reed relays; ruthenium; ruthenium compounds; 450 C; 50 A; Auger electron spectroscopy; contact reed switches; ellipsometry; high temperature O2 treatment; surface deactivation treatment; treatment temperature; Absorption; Contacts; Electrons; Ellipsometry; Platinum; Stress; Surface cracks; Surface treatment; Switches; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical Contacts, 1989., Proceedings of the Thirty Fifth Meeting of the IEEE Holm Conference on
Conference_Location :
Chicago, IL
Type :
conf
DOI :
10.1109/HOLM.1989.77937
Filename :
77937
Link To Document :
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