• DocumentCode
    2987106
  • Title

    3-D fabrication of microfluidic channels in fused silica using focused femtosecond laser beams

  • Author

    Hnatovsky, Cyril ; Taylor, Rod S. ; Bhardwaj, Ravi ; Simova, Eli ; Rayner, David M. ; Corkum, Paul B.

  • Author_Institution
    Phys. Dept., Ottawa Univ., Ont., Canada
  • Volume
    3
  • fYear
    2005
  • fDate
    22-27 May 2005
  • Firstpage
    2040
  • Abstract
    We demonstrate polarization dependence of the etch rate in femtosecond laser fabrication of 3-D microfluidic channels. We also show the existence of an energy threshold at which etching becomes highly selective.
  • Keywords
    etching; high-speed optical techniques; laser beams; laser materials processing; light polarisation; microfluidics; optical fabrication; optical focusing; silicon compounds; SiO2; etch rate; focused femtosecond laser beams; fused silica; microfluidic channel fabrication; polarization dependence; Chemical lasers; Etching; Laser beams; Lenses; Microfluidics; Optical device fabrication; Optical materials; Silicon compounds; Ultrafast optics; Writing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 2005. (CLEO). Conference on
  • Print_ISBN
    1-55752-795-4
  • Type

    conf

  • DOI
    10.1109/CLEO.2005.202361
  • Filename
    1573427
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2987106