DocumentCode :
2988667
Title :
Process Parameters of Mold Fabrication for Nano-Imprint Lithography
Author :
Le, Yan ; Hansong, Li ; Hongzhong, Liu
Author_Institution :
Sch. of Mech. & Electr. Eng., Beijing Inf. Sci. & Technol. Univ., Beijing, China
fYear :
2010
fDate :
25-27 June 2010
Firstpage :
5421
Lastpage :
5424
Abstract :
In nano-imprint lithography, PDMS is chosen to be soft mold material, which has features of excellent demolding character and large transferring area of imprinting pattern. Besides, the soft mold uses quartz as substrate. Impacts of technical parameters, such as the vacuum casting pressure, the curing temperature and time, on PDMS performance are analyzed. The experiments results show that the vacuum pressure is 2.3 × 10-2 Pa; the curing temperature is 40°C, and the curing time is 45 hours. These optimized parameters keep adequate demold and pattern accuracy, thus adoption of PDMS soft mold could not only fulfill the precision NIL process, but also improve productivity.
Keywords :
curing; moulding; nanofabrication; nanolithography; soft lithography; PDMS; curing; demolding; mold fabrication; nanoimprint lithography; soft mold material; vacuum casting pressure; Casting; Curing; Fabrication; Information science; Nanolithography; Silicon; PDMS; imprint lithography; soft mold;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical and Control Engineering (ICECE), 2010 International Conference on
Conference_Location :
Wuhan
Print_ISBN :
978-1-4244-6880-5
Type :
conf
DOI :
10.1109/iCECE.2010.1316
Filename :
5630313
Link To Document :
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