Abstract :
Summary form only given. Zyvex (www.zyvex.com) is the first molecular nanotechnology company with a vision of developing adaptable, affordable, molecularly precise manufacturing. New tools are required to manipulate nanoscale objects and Zyvex has built a family of nanomanipulators capable of flexible 3D nanomanipulation, The sProberTM and nProberTM, which are used by major semiconductor companies worldwide, are capable of probing 90, 65, and 45 nm node technology with 5 nm resolution of movement and cartesian xy,z motion. These systems are installed in scanning electron microscopes (SEMs) or dual beam focused ion beam (FIBs) providing a clean, stable environment for probing and electrical characterization, Zyvex´s nanoprobers (consisting of 4, 5, 6 and 8 probes with probe tip size smaller than 50 nm) are capable of characterizing transistors in die and at the contact level, finding and characterizing non visual fails, which are difficult to diagnose with other conventional techniques. Zyvex´s nanomanipulator system can also probe copper, gold, and aluminum metal 1 layers. Zyvex´s four probe system has been employed to characterize suspected failing transistors that makeup SRAM, DRAM, flash RAM and logic devices. Very recently, Zyvex has developed a novel 8 probe system combined with a FEI SEM to probe an entire SRAM bit cell at the metal 1 layer. The nProbe is also completely encoded and includes many upgrades for higher throughput and easier to use. In this talk, Dr Liu will provide an overview on Zyvex Nanotechnology R&D efforts and its nanoprobing technologies for semiconductor failure analysis as well as next generation device characterization.
Keywords :
DRAM chips; SRAM chips; failure analysis; flash memories; focused ion beam technology; logic devices; nanoelectronics; scanning electron microscopy; semiconductor device manufacture; DRAM; FIB; SEM; SRAM; Zyvex; dual beam focused ion beam; electrical characterization; flash RAM; flexible 3D nanomanipulation; logic devices; molecularly precise manufacturing; nanoprobers; nanoscale objects; nanotechnology; scanning electron microscopes; semiconductor devices; semiconductor failure analysis; size 45 nm; size 65 nm; size 90 nm; Contacts; Copper; Electron beams; Ion beams; Nanotechnology; Probes; Random access memory; Scanning electron microscopy; Semiconductor device manufacture; Semiconductor devices;