DocumentCode
2989721
Title
Numerical simulation and modeling of static characteristics and electrical noise in submicron MOS transistors
Author
Fadlallah, M. ; Ghibaudo, G. ; Jomaah, J. ; Zoaeter, M.
Author_Institution
INPG, CNRS, Grenoble, France
Volume
2
fYear
2000
fDate
2000
Firstpage
940
Abstract
This work presents the electrical performances of MOS transistors strongly submicronic in terms of the output/transfer characteristics, the threshold voltage, and the short channel effect which are analyzed by numerical simulations and semi-analytical calculations. The analytical modeling is carried out by generalizing an approach giving the surface potential along the channel strong inversion mode by taking into account the nonuniformity related to the short channel effects. Thus, this model is used to calculate the fluctuations of the carrier number and the electrical noise corresponding to strongly submicronic MOS transistors
Keywords
MOSFET; inversion layers; semiconductor device models; semiconductor device noise; surface potential; carrier number; channel strong inversion mode; electrical noise; nonuniformity; numerical simulations; output/transfer characteristics; semi-analytical calculations; short channel effect; static characteristics; submicron MOS transistors; surface potential; threshold voltage; Analytical models; Doping; Fluctuations; Integrated circuit modeling; MOSFETs; Numerical models; Numerical simulation; Semiconductor process modeling; Surface fitting; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronics, Circuits and Systems, 2000. ICECS 2000. The 7th IEEE International Conference on
Conference_Location
Jounieh
Print_ISBN
0-7803-6542-9
Type
conf
DOI
10.1109/ICECS.2000.913031
Filename
913031
Link To Document