• DocumentCode
    2989721
  • Title

    Numerical simulation and modeling of static characteristics and electrical noise in submicron MOS transistors

  • Author

    Fadlallah, M. ; Ghibaudo, G. ; Jomaah, J. ; Zoaeter, M.

  • Author_Institution
    INPG, CNRS, Grenoble, France
  • Volume
    2
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    940
  • Abstract
    This work presents the electrical performances of MOS transistors strongly submicronic in terms of the output/transfer characteristics, the threshold voltage, and the short channel effect which are analyzed by numerical simulations and semi-analytical calculations. The analytical modeling is carried out by generalizing an approach giving the surface potential along the channel strong inversion mode by taking into account the nonuniformity related to the short channel effects. Thus, this model is used to calculate the fluctuations of the carrier number and the electrical noise corresponding to strongly submicronic MOS transistors
  • Keywords
    MOSFET; inversion layers; semiconductor device models; semiconductor device noise; surface potential; carrier number; channel strong inversion mode; electrical noise; nonuniformity; numerical simulations; output/transfer characteristics; semi-analytical calculations; short channel effect; static characteristics; submicron MOS transistors; surface potential; threshold voltage; Analytical models; Doping; Fluctuations; Integrated circuit modeling; MOSFETs; Numerical models; Numerical simulation; Semiconductor process modeling; Surface fitting; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics, Circuits and Systems, 2000. ICECS 2000. The 7th IEEE International Conference on
  • Conference_Location
    Jounieh
  • Print_ISBN
    0-7803-6542-9
  • Type

    conf

  • DOI
    10.1109/ICECS.2000.913031
  • Filename
    913031