DocumentCode :
298981
Title :
CVD dynamics for real-time control: multi-component and flow modelling
Author :
Gevelber, M.A. ; Quiñones, M.T. ; Bufano, M.L. ; Deniz, M.C. ; Stubbs, A. ; Weeks, J. ; Grunke, K.
Author_Institution :
Dept. of Manuf. Eng., Boston Univ., MA, USA
Volume :
2
fYear :
1995
fDate :
21-23 Jun 1995
Firstpage :
1220
Abstract :
An expanded nonlinear dynamic model of chemical vapor deposition (CVD) is presented and analysed to obtain insight into the design of an appropriate control structure
Keywords :
batch processing (industrial); chemical vapour deposition; closed loop systems; flow; poles and zeros; process control; real-time systems; chemical vapor deposition; control structure; expanded nonlinear dynamic model; flow modelling; multi-component modelling; real-time control; Chemical vapor deposition; Coatings; Delay effects; Fluid dynamics; Heat transfer; Inductors; Physics; Pressure control; Virtual manufacturing; Weight control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
American Control Conference, Proceedings of the 1995
Conference_Location :
Seattle, WA
Print_ISBN :
0-7803-2445-5
Type :
conf
DOI :
10.1109/ACC.1995.520944
Filename :
520944
Link To Document :
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