DocumentCode
2990266
Title
Low-field mobility and piezoresistivity of holes in germanium and silicon
Author
Dragunov, V.P. ; Boldyrev, D.V.
Author_Institution
Novosibirsk State Tech. Univ., Russia
fYear
2000
fDate
2000
Firstpage
14
Lastpage
17
Abstract
A theoretical calculation of the low-field mobility and piezoresistance coefficients of holes in germanium and silicon is carried out incorporating all relevant details of the band structure. The scattering have been limited to acoustic and optical phonons and ionized-impurity and is described by the deformation potentials a, b, d and d0. Values of the piezoresistance coefficients are calculated using matrix 6×6 expressions for the strain dependent energy-wave vector relations of the valence bands and the known deformation potentials. The calculated values of the first-order piezoresistance coefficients are found to agree fairly well with the experimental data
Keywords
electron-phonon interactions; elemental semiconductors; germanium; hole mobility; impurity scattering; piezoresistance; silicon; Ge; Si; acoustic phonon scattering; band structure; deformation potential; germanium; hole mobility; ionized impurity scattering; optical phonon scattering; piezoresistance coefficient; silicon; valence band; Acoustic scattering; Conductivity; Crystals; Germanium; Laser sintering; Optical scattering; Phonons; Photonic band gap; Piezoresistance; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Instrument Engineering Proceedings, 2000. APEIE-2000. Volume 1. 2000 5th International Conference on Actual Problems of
Conference_Location
Novosibirsk
Print_ISBN
0-7803-5903-8
Type
conf
DOI
10.1109/APEIE.2000.913077
Filename
913077
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