Title :
Plane-view Transmission Electron Microscopy for Advanced Integrated Circuit
Author :
Liu, Pan ; Li, K. ; Eddie, E.R. ; Zhao, Siping
Author_Institution :
Chartered Semicond. Manuf. Ltd., Singapore
fDate :
Oct. 29 2006-Dec. 1 2006
Abstract :
In this paper, the authors try to introduce three techniques for plane-view TEM sample preparation. First, traditional plane-view TEM sample preparation will be introduced. The second technique is FIB- based lift-out method, which places the sample on the carbon film. This technique is used to cut isolated defects, such as SRAM single bit failure, but this technique introduces artifacts from FIB ion damage and carbon film. The last technique is a combination of tripod polishing, FIB milling and ion milling. Specific cases will be given to illustrate the application of these techniques.
Keywords :
integrated circuits; polishing; transmission electron microscopy; FIB milling; SRAM single bit failure; advanced integrated circuit; ion milling; plane-view transmission electron microscopy; tripod polishing; Amorphous materials; Circuits; Condition monitoring; Dielectric substrates; Erbium; Milling; Process control; Random access memory; Transmission electron microscopy; Wood industry;
Conference_Titel :
Semiconductor Electronics, 2006. ICSE '06. IEEE International Conference on
Conference_Location :
Kuala Lumpur
Print_ISBN :
0-7803-9730-4
Electronic_ISBN :
0-7803-9731-2
DOI :
10.1109/SMELEC.2006.380709